Radiant energy – Radiant energy generation and sources – With radiation modifying member
Reexamination Certificate
2008-04-10
2010-11-02
Souw, Bernard E (Department: 2881)
Radiant energy
Radiant energy generation and sources
With radiation modifying member
C250S493100
Reexamination Certificate
active
07825391
ABSTRACT:
Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can produce a plasma pinch that can last several orders of magnitude longer than what is typically sustained in a Z-pinch, thus enabling the device to provide more power output than what has been hitherto predicted in theory or attained in practice. Such power output may be used in a lithography system for manufacturing integrated circuits, enabling the use of EUV wavelengths on the order of about 13.5 nm. Lastly, the process of manufacturing such a plasma pinch is discussed, where the process includes providing a sheared flow of plasma in order to stabilize it for long periods of time.
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Golingo Raymond
Nelson Brian A.
Shumlak Uri
Smyth Andrew
Souw Bernard E
The University of Washington
Woodcock & Washburn LLP
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