Plasma-based EUV light source

Details Plasma-based EUV light source Plasma-based EUV light source

2008-05-13

2008-05-13

Berman, Jack (Department: 2881)

Radiant energy

Radiant energy generation and sources

With radiation modifying member

C250S505100, C250S493100, C378S119000, C378S121000, C378S122000, C378S145000, C378S034000, C378S084000, C315S111310, C315S111410, C315S111810, C315S111910, C219S121310, C219S121410, C219S121480, C313S231310, C313S231410

Reexamination Certificate

active

11252021

ABSTRACT:
Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can produce a plasma pinch that can last several orders of magnitude longer than what is typically sustained in a Z-pinch, thus enabling the device to provide more power output than what has been hitherto predicted in theory or attained in practice. Such power output may be used in a lithography system for manufacturing integrated circuits, enabling the use of EUV wavelengths on the order of about 13.5 nm. Lastly, the process of manufacturing such a plasma pinch is discussed, where the process includes providing a sheared flow of plasma in order to stabilize it for long periods of time.

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