Plasma-assisted processing of gaseous media

Details Plasma-assisted processing of gaseous media Plasma-assisted processing of gaseous media

2005-05-10

2005-05-10

Mayekar, Kishor (Department: 1753)

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

With means applying electromagnetic wave energy or...

C060S275000

Reexamination Certificate

active

06890495

ABSTRACT:
A reactor for the plasma-assisted processing of a gaseous medium, including a pair of electrodes having facing surfaces the separation of which is substantially uniform, with a body of dielectric material positioned between them and defining a plurality of gas passages extending through the space between the electrodes.

REFERENCES:
patent: 822981 (1906-06-01), Paterson
patent: 4954320 (1990-09-01), Birmingham et al.
patent: 5746051 (1998-05-01), Kieser
patent: 5822981 (1998-10-01), Williamson et al.
patent: 0 366 876 (1990-05-01), None
patent: 04 027 414 (1992-05-01), None
patent: WO 99 43 419 (1999-02-01), None

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