Plasma assisted process vessel cleaner

Details Plasma assisted process vessel cleaner Plasma assisted process vessel cleaner

1999-03-09

2000-10-31

Beck, Shrive

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118715, 134 11, H05H 100, C27C 1600

Patent

active

061396818

ABSTRACT:
A system and method for removing plasma contaminants from a vacuum vessel requires circulating a fluid through the vacuum vessel and thereby exposing the fluid to the contaminants. When the contaminants contact the fluid, they are trapped and become suspended in the fluid. The contaminants are then removed from the vacuum vessel along with the fluid. Subsequently, the contaminants can be removed from the fluid, and the fluid reintroduced into the vessel for the subsequent removal of additional contaminants. For one embodiment, a cleaning plasma is generated in the vacuum chamber which interacts with the contaminants to create neutrals. The fluid is then circulated through channels that are formed into a tray which is inserted into the bottom of the chamber. The neutrals then fall into the fluid on the tray, while magnetic shields prevent the cleaning plasma itself from doing so. In another embodiment, the vacuum vessel is an open-ended, hollow, cylindrical centrifuge which is tilted from the vertical. The fluid is then poured into the upper end of the cylinder as it is rotated to allow the fluid to coat the wall of the vessel. For this embodiment, the ions of high mass contaminants are driven from the plasma by centrifugal force and are caused to become trapped and suspended in the fluid at the vessel wall. The suspended contaminants are removed with the fluid at the bottom end of the cylinder.

REFERENCES:
patent: 5556765 (1996-09-01), Dedolph
patent: 5868909 (1999-02-01), Eastlund
patent: 5888830 (1999-03-01), Mohan et al.
patent: 5961773 (1999-10-01), Ichimura et al.
Anders, Andre, Interaction of Vacuum-Arc-Generated Macroparticles with a Liquid Surface; American Institute of Physics; 1998, 3 pages. (3199-3201) (no month).

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