Plasma assisted modified betatron

Details Plasma assisted modified betatron Plasma assisted modified betatron

1985-12-10

1987-06-02

Buczinski, Stephen C.

Electric lamp and discharge devices

With temperature modifier

For lead-in-seal or stem protection

313 62, H05H 700, H05H 1100

Patent

active

H00002909

ABSTRACT:
In a modified Betatron a low density background plasma is maintained in the vacuum chamber causing image charges in response thereto to form in the chamber wall. These image charges cause the self forces of the electron beam being accelerated in the betatron to be directed inward in the polodial plane thus eliminating injection problems, the diamagnetic to paramagnetic transition, and the l=2 resistive wall instability.

REFERENCES:
patent: 3975689 (1976-08-01), Geizer et al.
patent: 4244782 (1981-01-01), Dow
patent: 4392111 (1983-07-01), Rostoker
Publication, Physical Review Letters, vol. 52, No. 18, "Successful Betatron Acceleration of Kiloampere Electron Rings in RECE-Christa." Taggart et al. Apr. 30, 1984.

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