Plasma-assisted method for thin film fabrication

Details Plasma-assisted method for thin film fabrication Plasma-assisted method for thin film fabrication

1986-10-21

1989-01-17

Niebling, John F.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 39, B05D 306

Patent

active

047987391

ABSTRACT:
A device has a low-pressure tank placed inside an airtight chamber for plasma-depositing onto at least two substrata spaced apart in a substantial parallel relationship in the tank thin films. To effect the decomposition of the gas reagent inside the tank, at least one perforated polarized plasma generating electrode is interposed between the substrate. The airtight chamber has a pressure lower than that of the tank.

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