Plasma-assisted metallic film deposition

Details Plasma-assisted metallic film deposition Plasma-assisted metallic film deposition

1998-04-29

2000-04-25

Breneman, Bruce

Coating apparatus

Gas or vapor deposition

With treating means

438584, H01L 3300

Patent

active

060531231

ABSTRACT:
An apparatus and method for depositing thin films on the surface of a device such as a spherical shaped devices. The apparatus includes an enclosure containing a plurality of apertures and two chambers. The apertures connect to conduits for inputting and outputting the devices as well as injecting and releasing different gases and/or processing constituents. A first chamber is formed within the enclosure and includes a plasma torch. A second chamber is formed within the enclosure and includes a heating coil. Devices move through the input conduit and into the first chamber where they are heated by the plasma torch. Because of this heating, radicals, electrons, and ions near the surface of the devices are generated. The heated devices then move into the second chamber where they are further heated by energy from the conductor coil. At this time, the gases and/or processing constituents react with the heated device thereby growing a thin film on its outer surface.

REFERENCES:
patent: 4741286 (1988-05-01), Itoh et al.
patent: 5298714 (1994-03-01), Szente et al.

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