Plasma ashing method and apparatus therefor

Details Plasma ashing method and apparatus therefor Plasma ashing method and apparatus therefor

1990-01-09

1993-07-06

Reynolds, Bruce A.

Industrial electric heating furnaces

Plasma furnace device

373 62, 156345, 156643, 156646, 204164, 2041921, 21912111, 21912136, 21912137, 2191214, 219390, H04B 700

Patent

active

052260569

ABSTRACT:
In a method for plasma ashing a resist film coated on a substrate, the temperature of the substrate is controlled initially at temperatures below that at which explosion of the resist film occurs until a surface portion of a resist film has been removed. Thereafter, the substrate temperature is increased to remove the remaining portions of the resist film. An apparatus for conducting the method includes a plurality of supports, which may be movably disposed within a vacuum treatment chamber for moving the substrate away from a source of heat and for moving the substrate into contact with the heating source.

REFERENCES:
patent: 4529474 (1985-07-01), Fujiyama et al.
patent: 4533820 (1985-08-01), Shimizu
patent: 4961812 (1990-10-01), Baerg et al.
patent: 4983254 (1991-01-01), Fujimura et al.
patent: 5034086 (1991-07-01), Sato

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