Plasma arc torch position control

Details Plasma arc torch position control Plasma arc torch position control

1998-02-09

2000-02-22

Hoang, Tu Ba

Electric heating

Metal heating

By arc

21912154, B23K 900

Patent

active

060282878

ABSTRACT:
A torch height control system maintains a substantially constant operating parameter of the arc during processing of a workpiece by measuring the operating parameter, comparing the operating parameter to a reference value to generate a deviation, adjusting a standoff between the torch and the workpiece by moving the torch relative to the workpiece at a rate which increases with an increase in the deviation to minimize the deviation, and clamping the rate of torch movement relative to the workpiece when the deviation exceeds a predetermined value.

REFERENCES:
patent: 4101754 (1978-07-01), Fischer
patent: 4203022 (1980-05-01), Couch, Jr. et al.
patent: 4415795 (1983-11-01), Ross et al.
patent: 4650957 (1987-03-01), Cullen et al.
patent: 4677275 (1987-06-01), Schmall
patent: 4682004 (1987-07-01), Schmall
patent: 4766286 (1988-08-01), Iceland
patent: 4795882 (1989-01-01), Hardwick et al.
patent: 4888490 (1989-12-01), Bass et al.
patent: 5160821 (1992-11-01), Oakley
patent: 5187348 (1993-02-01), Cuba et al.
patent: 5192847 (1993-03-01), Jagiella et al.
patent: 5288970 (1994-02-01), Nishi
patent: 5290995 (1994-03-01), Higgins et al.
patent: 5326955 (1994-07-01), Nishi et al.
patent: 5371336 (1994-12-01), Albert et al.
patent: 5521350 (1996-05-01), Nishi et al.
patent: 5620617 (1997-04-01), Borowy et al.
patent: 5844197 (1998-12-01), Daniel
patent: 5866872 (1999-02-01), Lu et al.

Affiliated with

Also associated with

Rating

Plasma arc torch position control does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma arc torch position control, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma arc torch position control will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-522289