Plasma arc apparatus for producing diamond semiconductor devices

Details Plasma arc apparatus for producing diamond semiconductor devices Plasma arc apparatus for producing diamond semiconductor devices

1992-07-02

1993-10-19

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Vacuum arc discharge coating

20419238, 427580, C23C 1432

Patent

active

052542378

ABSTRACT:
A diamond deposition system and process for producing diamond semiconductor devices. A multiple gun plasma arc deposition system allows controlled deposition of diamond-like materials on a substrate. Deposition is controlled by controlling the time duration of pulses to a main gun, an acceptor gun and donor gun in a vacuum chamber that may contain a small amount of hydrogen. The deposition process is also enhanced with microwave temperature control and substrate dithering with a transducer.

REFERENCES:
patent: 4645895 (1987-02-01), Boxman et al.
patent: 4648952 (1987-03-01), Savov et al.
patent: 4877640 (1989-10-01), Muehlberger et al.
patent: 5013578 (1991-05-01), Brown et al.

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