Plasma apparatus

Details Plasma apparatus Plasma apparatus

1991-07-19

1993-08-17

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419233, 20429837, 156345, C23F 100

Patent

active

052365565

ABSTRACT:
A plasma generating section generates a plasma in a process vessel. A plasma process section executes a plasma process to a substance to be processed by moving the plasma generated by the plasma generating section. A sensor section outputs an electrical signal corresponding to the intensity of plasma light having a predetermined wavelength in the plasma when the plasma process is executed by the plasma process section. A smoothing section smooths the electrical signal output from the sensor section. A end-point detecting section detects an end-point of the plasma process in accordance with the signal smoothed by the smoothing section.

REFERENCES:
patent: 4846928 (1989-07-01), Dolins et al.
patent: 5097430 (1992-03-01), Birang

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