Coherent light generators – Particular active media – Gas
Patent
1988-01-25
1989-12-26
Gonzalez, Frank
Coherent light generators
Particular active media
Gas
372 59, 372 61, 372 64, 372 76, 372 81, 372 82, 372 83, H01S 322
Patent
active
048902942
ABSTRACT:
The invention relates to a plasma apparatus where plasma is generated utilizing microwave discharge and laser excitation is performed and plasma processing is performed. More specifically, in a plasma apparatus where a microwave from a microwave oscillator is transmitted through a microwave transmission path to a microwave circuit, and plasma is generated by a microwave discharge within the microwave circuit, a plasma generating medium for generating the plasma is filled in a space formed between a conductor wall constituting a part of the microwave circuit and a dielectric installed opposite to the conductor wall, and the microwave circuit forms microwave mode having an electric field component orthogonal to the boundary between the dielectric and the plasma.
REFERENCES:
patent: 3602837 (1971-08-01), Goldsborough
patent: 4169251 (1979-09-01), Laakmann
patent: 4429398 (1984-01-01), Chenausky et al.
patent: 4455658 (1984-06-01), Sutter Jr.
patent: 4494236 (1985-01-01), Sutter Jr.
patent: 4577323 (1986-03-01), Newman et al.
patent: 4703489 (1987-10-01), Ross
patent: 4719640 (1988-01-01), Chenausky et al.
patent: 4751715 (1988-06-01), Henderson
Handy et al., "Laser Generation by Pulsed 2.45 Ghz Microwave Excitation of CO.sub.2 ", Applied Physics, vol. 49, No. 7, Jul. 1978, pp. 3753-3756.
Wisoff et al., "Improved Performance of the Microwave-Pumped XeCl Laser", IEEE Journal of Quantum Electronics, vol. QE-18, No. 11, Nov. 1982, pp. 1839 and 1840.
Smith et al., "Waveguide Tea Laser"; Appl. Phys. Lett., vol. 23, No. 9,; 1 Nov. 1973; pp. 524-526.
Adam et al., "Transversely Excited--Waveguide Laser"; Appl. Phys., vol. 8, No. 4; 12/1975; pp. 281-291.
Gibson et al..; "a Transversely Excited--Waveguide Laser"; appl. Phys. Lett., vol. 31, No. 3; 1 Aug. 1977; pp. 176-178.
Iwata Akihiko
Nishimae Jun-ichi
Taki Masakazu
Ueda Yoshihiro
Yanagi Tadashi
Gonzalez Frank
Mitsubishi Denki & Kabushiki Kaisha
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