Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1996-03-25
1997-10-21
Powell, William
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
1566431, H01L 2100
Patent
active
056792042
ABSTRACT:
Components such as an earth plate, a gas introduction ring, and the like placed in a reaction chamber in a plasma apparatus are made of aluminum containing magnesium in a concentration of 2.2 to 2.8% by weight and are not coated with alumite. In addition, a heater incorporated in a section of the reaction chamber heats the section during a plasma cleaning process. Further, an electrical discharge chamber is also incorporated in the plasma apparatus for providing a plasma to the reaction chamber for efficient plasma cleaning of the apparatus.
REFERENCES:
patent: 5364496 (1994-11-01), Bollinger et al.
Kobayashi Masayuki
Komemura Toshio
Maeda Kiyoshi
Matsumura Tamio
Ohnishi Hiroshi
Mitsubishi Denki & Kabushiki Kaisha
Powell William
Ryoden Semiconductor System Engineering Corporation
Shikoku Instrumentation Co., Ltd.
LandOfFree
Plasma apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1003696