Plasma-and-magnetic field-assisted, high-power microwave source

Details Plasma-and-magnetic field-assisted, high-power microwave source Plasma-and-magnetic field-assisted, high-power microwave source

1995-09-14

1997-12-02

Lee, Benny T.

Electric lamp and discharge devices: systems

Combined load device or load device temperature modifying...

Distributed parameter resonator-type magnetron

315 393, 330 41, H03F 354, H01P 2324

Patent

active

056940050

ABSTRACT:
The invention is directed to the reduction of an electron beam transport problem during microwave generation in plasma-assisted microwave sources. A small, e.g., <200 gauss, secondary magnetic field is positioned in association with a slow-wave structure (SWS) of the sources to reduce the radial divergence of electron bunches in the sources' electron beams. The secondary magnetic field exerts radial forces on diverging electrons to supplement radial forces of a primary magnetic field and radial forces of an electrostatic field. The primary magnetic field is generated by electron movement in the electron beam and the electrostatic field is generated by ions which are created as the electron beam transits an ionizable gas in the plasma-assisted source. The addition of the secondary magnetic field can be implemented with a coil that is positioned to direct at least a portion of its magnetic field through a passage of the SWS.

REFERENCES:
patent: 3171053 (1965-02-01), Targ et al.
patent: 3317784 (1967-05-01), Ferrari
patent: 3356965 (1967-12-01), Agdur
patent: 3916239 (1975-10-01), Friedlander
patent: 4912367 (1990-03-01), Schmacher et al.
patent: 4978889 (1990-12-01), Schumacher
patent: 5537005 (1996-07-01), Goebel et al.

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