Plasma-activated chemical vapor deposition of fluoridated cyclic

Details Plasma-activated chemical vapor deposition of fluoridated cyclic Plasma-activated chemical vapor deposition of fluoridated cyclic

1992-07-20

1993-07-27

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427 58, 427249, 427255, 427316, 427318, 427535, 427553, 427573, 427574, 427575, 427577, 427578, B05D 306

Patent

active

052309290

ABSTRACT:
The present invention refers to coatings produced by means of the deposit of thin films formed by plasma-activated chemical vapor deposition of volatile fluoridated cyclic siloxanes having the structure [RR'SiO].sub.x, where R is an alkyl group with 1-6 carbon atoms, R' is a fluorinated alkyl group with 3-10 carbon atoms, the carbon in the alpha and beta positions with respect to the silicon atom is hydrogenated and x is 3 or 4. These particular coatings are useful because of their properties of protection and insulation.

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