Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate
2005-01-11
2005-01-11
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
C430S165000, C430S166000, C430S191000, C430S192000, C430S193000, C430S270100, C430S271100, C430S273100, C430S302000
Reexamination Certificate
active
06841330
ABSTRACT:
A positive planographic printing plate precursor comprising a recording layer containing a water-insoluble and alkali-soluble resin, an infrared absorbent and an organic quaternary ammonium salt. A positive planographic printing plate precursor comprising at least two recording layers containing the resin and the infrared absorbent with a coating amount of an upper positive recording layer being in the range of 0.05 to 0.45 g/m2.
REFERENCES:
patent: 4696891 (1987-09-01), Guzzi
patent: 4792516 (1988-12-01), Toriumi et al.
patent: 5525453 (1996-06-01), Przybilla et al.
patent: 5731123 (1998-03-01), Kawamura et al.
patent: 6060217 (2000-05-01), Nguyen et al.
patent: 6083663 (2000-07-01), Vermeersch et al.
patent: 6117610 (2000-09-01), Sheriff et al.
patent: 6153353 (2000-11-01), Van Damme et al.
patent: 6352811 (2002-03-01), Patel et al.
patent: 0 908 307 (1999-04-01), None
patent: 908307a1 (1999-04-01), None
patent: 0 997 272 (2000-05-01), None
patent: 997272a2 (2000-05-01), None
Iwato Kaoru
Mitsumoto Tomoyoshi
Miyake Hideo
Oda Akio
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