Plane position detecting method and exposing method and exposure

Photocopying – Projection printing and copying cameras – Focus or magnification control

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355 53, 355 56, 355 71, 356399, 356400, G03B 2752, G01B 1100

Patent

active

061633690

ABSTRACT:
The position or the inclination of a substrate surface is detected at a high accuracy and a high speed, and corrected. When moving the substrate in a direction substantially at right angles to an optical axis of a projection optical system and feeding an area on the substrate into an image space of the projection optical system, at least one of the position and inclination in the optical axis direction of the substrate is detected, to bring that area into focus with the focal plane of the projection optical system. One of a first mode of conducting the measurement during travel of the substrate and a second mode of performing the measurement in a state in which that area has substantially been positioned in the image space is selected.

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patent: 5825043 (1998-10-01), Suwa
patent: 5969800 (1999-10-01), Makinouchi
patent: 6018384 (2000-01-01), Ota

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