Planarizing silsesquioxane copolymer coating

Details Planarizing silsesquioxane copolymer coating Planarizing silsesquioxane copolymer coating

1990-03-15

1991-08-27

Lusignan, Michael

Metal treatment

Stock

Ferrous

148 333, 427387, 437235, 437243, H01L 2147, H01L 2156, H01L 2934

Patent

active

050437895

ABSTRACT:
An improved insulating layer is formed by applying to a suitable substrate an organic solution, prepared by reacting an aminoalkoxysilane monomer, an arylalkoxysilane or arylsilazane monomer and water in a solvent, and then heating the coated substrate under conditions so as to evaporate the solvent and form a layer of cured ladder-type silsesquioxane copolymer. The insulating layer, which demonstrates excellent planarizing and thermal stability characteristics, is particularly useful in semiconductor device applications.

REFERENCES:
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patent: 4801507 (1989-01-01), Estes et al.
patent: 4981530 (1991-01-01), Clodgo et al.
Clodgo, D. J., et al., "Polysiloxane Dielectric for Multi-Level Metal", IBM Tech. Discl. Bull., vol. 28, No. 12 (May 1986), p. 5246.

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