Electric lamp or space discharge component or device manufacturi – Process – Electrode making
Patent
1995-08-24
1997-11-18
Ramsey, Kenneth J.
Electric lamp or space discharge component or device manufacturi
Process
Electrode making
H01J 902
Patent
active
056881584
ABSTRACT:
A planarization method for use during manufacture of a microelectronic field emitter device, comprising applying a glass frit slurry including glass particles in a removable base, and subsequently baking to liquify the frit. The invention relates in another aspect to a method of making a microelectronic field emitter device, comprising the steps of: applying a patterned layer of liftoff profile resist over a substrate to define emitter conductor locations; employing the patterned resist layer to form trenches in the substrate at the emitter conductor locations; depositing emitter conductor metal in the trenches and over the patterned resist layer; removing the patterned resist layer; depositing a current limiter layer over the conductors and substrate areas between trenches; depositing a layer of emitter material; pattern masking and etching the layer of emitter material to form emitter structures; depositing gate dielectric; applying a patterned layer of liftoff profile resist over the gate dielectric; evaporating gate metal; and removing the patterned resist layer to define gate electrodes.
REFERENCES:
patent: 2926286 (1960-02-01), Skellett
patent: 3665241 (1972-05-01), Spindt et al.
patent: 3753022 (1973-08-01), Fraser, Jr.
patent: 3921022 (1975-11-01), Levine
patent: 3935500 (1976-01-01), Oess et al.
patent: 3970887 (1976-07-01), Smith et al.
patent: 3982147 (1976-09-01), Redman
patent: 3998678 (1976-12-01), Fukase et al.
patent: 4008412 (1977-02-01), Yuito et al.
patent: 4095133 (1978-06-01), Hoeberechts
patent: 4163949 (1979-08-01), Shelton
patent: 4164680 (1979-08-01), Villalobos
patent: 4256532 (1981-03-01), Magdo et al.
patent: 4277883 (1981-07-01), Kaplan
patent: 4307507 (1981-12-01), Gray et al.
patent: 4325000 (1982-04-01), Wolfe et al.
patent: 4337115 (1982-06-01), Ikeda et al.
patent: 4341980 (1982-07-01), Noguchi et al.
patent: 4498952 (1985-02-01), Christensen
patent: 4513308 (1985-04-01), Greene et al.
patent: 4578614 (1986-03-01), Gray et al.
patent: 4614564 (1986-09-01), Sheldon et al.
patent: 4663559 (1987-05-01), Christensen
patent: 4670090 (1987-06-01), Sheng et al.
patent: 4683024 (1987-07-01), Miller et al.
patent: 4685996 (1987-08-01), Busta et al.
patent: 4724328 (1988-02-01), Lischke
patent: 4774433 (1988-09-01), Ikebe et al.
patent: 4818914 (1989-04-01), Brodie
patent: 4824795 (1989-04-01), Blanchard
patent: 4853545 (1989-08-01), Rose
patent: 4900981 (1990-02-01), Yamazaki et al.
patent: 4934773 (1990-06-01), Becker
patent: 4964946 (1990-10-01), Gray et al.
patent: 4990766 (1991-02-01), Simms et al.
patent: 5012153 (1991-04-01), Atkinson et al.
patent: 5030895 (1991-07-01), Gray
patent: 5053673 (1991-10-01), Tomil et al.
patent: 5063327 (1991-11-01), Brodie et al.
patent: 5070282 (1991-12-01), Epszein
patent: 5129850 (1992-07-01), Kane et al.
patent: 5140219 (1992-08-01), Kane
patent: 5141459 (1992-08-01), Zimmerman
patent: 5141460 (1992-08-01), Jaskie et al.
patent: 5142184 (1992-08-01), Kane
patent: 5144191 (1992-09-01), Jones et al.
patent: 5164632 (1992-11-01), Yoshida et al.
patent: 5188977 (1993-02-01), Stengl et al.
patent: 5191217 (1993-03-01), Kane et al.
patent: 5204666 (1993-04-01), Aoki et al.
patent: 5216324 (1993-06-01), Curtin
patent: 5227769 (1993-07-01), Leksell et al.
patent: 5309169 (1994-05-01), Lippert
patent: 5313137 (1994-05-01), Witty
patent: 5371433 (1994-12-01), Horne et al.
patent: 5374868 (1994-12-01), Tjaden et al.
patent: 5384509 (1995-01-01), Kane et al.
patent: 5386175 (1995-01-01), Van Gorkom et al.
patent: 5406170 (1995-04-01), Uemura et al.
patent: 5457356 (1995-10-01), Parodos
patent: 5475280 (1995-12-01), Jones et al.
Warren, John B. "Control of silicon field emitter shape with isotropically etched oxide masks," Inst. Phys. Conf. Ser. No. 99: Section 2, 1989, pp. 37-40.
Costa Michael J.
Jones Gary W.
Jones Susan K. Schwartz
Silvernail Jeffrey A.
Zimmerman Steven M.
FED Corporation
Ramsey Kenneth J.
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