Planarized, reusable calibration grids

Details Planarized, reusable calibration grids Planarized, reusable calibration grids

1990-10-25

1991-08-27

Berman, Jack I.

Radiant energy

Means to align or position an object relative to a source or...

2502521, 2504922, H01J 37304

Patent

active

050435868

ABSTRACT:
An improved structure for electron beam lithography grids and a method of fabricating such grids yields calibration grids having grid lines coplanar with the surface of a the grid body and laterally supported by grooves formed in the grid body and which can also be cleaned after contamination by outgassing resist during use by virtue of the provision of such lateral support for the grid lines. The grid exhibits improved accuracy due to the technique of fabrication of the grooves. The invention thus allows the electron beam lithography process to be conducted with less expense and at a greater speed. The improved accuracy of the calibration grid also permits integrated circuits and masks used in the fabrication of such devices to be designed more flexibly and fabricated at reduced cost and improved integration densities and manufacturing yields.

REFERENCES:
patent: 3982837 (1976-09-01), Cummins
patent: 4056730 (1977-11-01), Davis et al.
patent: 4390789 (1983-06-01), Smith et al.
patent: 4397937 (1983-08-01), Clecak et al.
patent: 4442361 (1984-04-01), Zasio et al.
patent: 4467211 (1984-08-01), Smith et al.
patent: 4665315 (1987-05-01), Bacchetti et al.
patent: 4728799 (1988-03-01), Gordon et al.
patent: 4885472 (1989-12-01), Young
IBM Technical Disclosure Bulletin, vol. 14, No. 2, Jul. 1971, pp. 417-418, "Fabricating Shaped Grid and Aperture Holes" by R. A. Leone and C. H. Ting.
"Correction of Non-Linear Distortion in a Direct Exposure Electron Beam System" by H. Engelke, J. F. Loughran, M. S. Michall & P. M. Ryan; IBM J. Res. Develop., Nov. 1977, pp. 506-513.
"Registration Mark Detection for Electron-Beam Lithography-ELI System" by Donale E. Davis, IBM J. Res. Develop.; vol. 24, No. 5, Sep. 1980.

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