Planarity detection methods and apparatus for...

Details Planarity detection methods and apparatus for... Planarity detection methods and apparatus for...

2005-08-30

2005-08-30

Hassenzadeh, Parviz (Department: 1763)

Electrolysis: processes, compositions used therein, and methods

Electrolytic coating

Treating electrolytic or nonelectrolytic coating after it is...

C205S123000, C205S640000

Reexamination Certificate

active

06936154

ABSTRACT:
The methods and systems described provide for an in-situ detection of planarity of a layer that is deposited on or etched off the surface of a substrate. Planarity can be detected using various detection mechanisms, including optical, electrical, mechanical and acoustical, in combination with the electrochemical mechanical processing methods, including electrochemical mechanical deposition and electrochemical mechanical etching. Once planarity is detected, a planarity signal can be used to terminate or alter a process that has been previously initiated, or begin a new process. In a preferred embodiment, an optical detection system is used to detect planarity during the formation of planar conductive layers obtained by electrochemical mechanical processing.

REFERENCES:
patent: 5911619 (1999-06-01), Uzoh et al.
patent: 6179691 (2001-01-01), Lee et al.
patent: 0 738 561 (1996-10-01), None
patent: 1 103 346 (2001-05-01), None
patent: WO 01/58643 (2001-08-01), None

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