Planar wave guide cladding

Details Planar wave guide cladding Planar wave guide cladding

1997-04-23

1999-03-23

Bowers, Charles

Semiconductor device manufacturing: process

Making passive device

438 31, 385130, G02B 610

Patent

active

058858814

ABSTRACT:
An optical circuit device having a core supported on a substrate incorporates a wave guide being in a layer of the core. The structure is provided with a cladding layer by depositing by means of a PECVD process a cladding material on the wave guide core and maintaining a negative bias between the substrate or the core and earth while the deposition is proceeding.

REFERENCES:
patent: 5253319 (1993-10-01), Bhagavatula
Rossnagel, "Glow Discharge Processes and Sources for Etching and Deposition", in Thin Film Processes II, edited by Vossen et al., Academic Press, pp. 18, 25-26 and 30-33 (no month given), 1991.
Reif et al., "Plasma-Enhanced Chemical Vapor Deposition", in Thin Film Processes II, edited by Vossen et al., Academic Press, p. 541 (no month given), 1991.

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