Planar voltage contrast test structure and method

Details Planar voltage contrast test structure and method Planar voltage contrast test structure and method

2007-01-09

2007-01-09

Schillinger, Laura M. (Department: 2813)

Semiconductor device manufacturing: process

With measuring or testing

C438S017000, C438S019000, C257S048000

Reexamination Certificate

active

10703285

ABSTRACT:
An integrated circuit and e-beam testing method are disclosed. The integrated circuit includes a test structure with a ground grid, a metal pad having a space therein and positioned within the ground grid, and a metal line connected to the ground grid and positioned in the space. Structures for detecting open circuits and short circuits are described.

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