Planar process using common alignment marks for well implants

Details Planar process using common alignment marks for well implants Planar process using common alignment marks for well implants

1994-06-13

1996-03-19

Chaudhari, Chandra

Fishing, trapping, and vermin destroying

437 34, 437924, H01L 2122

Patent

active

055003923

ABSTRACT:
A preferred embodiment of the present invention is a method of forming a device on a semiconductor substrate of a first conductivity type, the method comprising: forming a semiconducting layer on the substrate; etching alignment marks in the semiconducting layer (102); forming a first mask on the semiconducting layer to expose portions of the semiconducting layer; introducing dopants of a second conductivity type opposite the first conductivity type into the exposed portions of the semiconducting layer to form high-voltage tanks (104); removing the first mask; annealing the dopants introduced to form high-voltage tanks of a second conductivity type (105); forming a second mask on the semiconducting layer to expose second portions of the semiconducting layer; introducing dopants of a second conductivity type into the exposed second portions of the semiconducting layer to form low-voltage tanks (106); removing the second mask; forming a third mask on the semiconducting layer to expose third portions of the semiconducting layer; introducing dopants of a first conductivity type into the exposed third portions of the semiconducting layer to form high-voltage tanks (107); removing the third mask; forming a fourth mask on the semiconducting layer to expose fourth portions of the semiconducting layer; introducing dopants of a first conductivity type into the exposed fourth portions of the semiconducting layer to form low-voltage tanks (108); and annealing dopants introduced to form high-voltage and low-voltage tanks of the first and second conductivity types.

REFERENCES:
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patent: 4936930 (1990-06-01), Gruber et al.
patent: 4981529 (1991-01-01), Tsujita
patent: 5002902 (1991-03-01), Watanabe
patent: 5047358 (1991-09-01), Kosiak et al.
patent: 5059546 (1991-10-01), Havemann
patent: 5075242 (1991-12-01), Nakahara
patent: 5242841 (1993-09-01), Smayling et al.

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