Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1987-03-31
1987-12-22
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
156345, 20419212, C23C 1434
Patent
active
047145366
ABSTRACT:
A planar magnetron sputtering device has an extended flat circular target source in opposed spaced parallel relationship with a generally flat article to be coated, placed within an evacuated coating chamber. Crossed electric and magnetic fields in the chamber are established in order to set up a plasma adjacent the target. The magnetic field is provided by a magnetic assembly of permanent magnets on the non-vacuum side of the target. The magnetic assembly is smaller in diameter than the target, but is mounted to a means for moving the assembly laterally over the entire area of the target. This means for moving sweeps the magnetic assembly in an eccentric path generally centered on the target center, with the path being non-reentrant and precessing about the target center with time. In this manner, the path sweeps different areas on successive rotations about the center, and a given area of target is exposed to the magnetic field at many successively different orientations. Articles are therefore coated with significantly improved uniformity and step coverage, while utilization of target material is improved.
REFERENCES:
patent: 4498969 (1985-02-01), Ramachandran
patent: 4673477 (1987-06-01), Ramalingam et al.
Freeman Kenneth F.
Garrett Charles B.
Harra David J.
Lei Lawrence C.
Cole Stanley Z.
Fisher Gerald M.
Nguyen Nam X.
Niebling John F.
Sgarbossa Peter J.
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