Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1978-09-27
1979-12-25
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204192R, C23C 1500
Patent
active
041804503
ABSTRACT:
In a planar magnetron sputtering device including a cathode of target material having a planar sputtering surface, at least a portion of which is disposed about a center line perpendicular to said surface, an anode adapted for establishing an accelerating electric field between the anode and cathode, and magnetic means for establishing a magnetic field adjacent the planar sputtering surface of the cathode for lengthening the path traveled by electrons removed from said cathode, and wherein the lines of force of the magnetic field extend over the sputtering surface of said cathode and pass through the cathode in the vicinity of the center line, the improvement where the magnetic means includes first magnet means for causing a majority of the magnetic lines of force to pass through the cathode in the vicinity of the center line at angles of 45.degree. or less with respect to its planar sputtering surface to thereby enhance the uniformity of cathode erosion and where the magnetic means includes further magnet means for causing the magnetic lines of force to be substantially perpendicular to the sputtering surface of the cathode at its approximate periphery.
REFERENCES:
patent: 3878085 (1975-04-01), Corbani
patent: 3956093 (1976-05-01), McLeod
patent: 4060470 (1977-11-01), Clarke
patent: 4100055 (1978-07-01), Rainey
patent: 4116806 (1978-09-01), Love et al.
Baker Joseph J.
Ferguson Jr. Gerald J.
Vac-Tec Systems, Inc.
Weisstuch Aaron
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