Planar magnetron sputtering device

Details Planar magnetron sputtering device Planar magnetron sputtering device

1983-06-16

1984-04-24

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

044446438

ABSTRACT:
A planar magnetron sputtering device having a movable magnetic source which is hydraulically moved with respect to a target and substrate to cause lines magnetic flux parallel to the surface of the target to sweep over the surface of the target during the sputtering process.

REFERENCES:
"Orbitorr-Dynamic Planar Magnetron Sputtering Source", Sloan Technology Corp., Santa Barbara, CA., (1977).

Affiliated with

Also associated with

Rating

Planar magnetron sputtering device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Planar magnetron sputtering device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Planar magnetron sputtering device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-114537