Planar magnetron cathode target assembly

Details Planar magnetron cathode target assembly Planar magnetron cathode target assembly

1986-02-24

1986-11-11

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, 2041922, C23C 1500

Patent

active

046221220

ABSTRACT:
An improved sputtering apparatus is provided in which the target assembly is a plurality of permanent magnets, e.g., samarium cobalt magnets.

REFERENCES:
patent: 4049761 (1978-06-01), Wilson
patent: 4159909 (1979-07-01), Wilson
patent: 4239611 (1980-12-01), Morrison
patent: 4265729 (1981-05-01), Morrison
patent: 4299678 (1981-11-01), Meckel
patent: 4324631 (1982-04-01), Meckel
patent: 4370217 (1983-01-01), Funaki
patent: 4412907 (1983-11-01), Ito et al.
patent: 4414087 (1983-11-01), Meckel
patent: 4431505 (1984-02-01), Morrison
patent: 4487675 (1984-12-01), Meckel
Hunter et al., IBM Tech. Disc. Bull., 20, (1977), p. 550y.

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