Planar lightwave circuit device and manufacturing method...

Details Planar lightwave circuit device and manufacturing method... Planar lightwave circuit device and manufacturing method...

2005-11-01

2005-11-01

Lee, John D. (Department: 2874)

Optical waveguides

Planar optical waveguide

C430S321000, C430S323000, C430S325000

Reexamination Certificate

active

06961503

ABSTRACT:
A manufacturing method for a planar lightwave circuit device. A lift-off mask layer is formed on a planar lightwave circuit composed of cores and a cladding. The lift-off mask layer is next exposed to light by using a mask having a plurality of first patterns respectively corresponding to the cores and a plurality of second patterns each formed on at least one side of each first pattern in spaced relationship therewith. A wiring pattern material layer is next deposited on the lift-off mask layer exposed above, and the lift-off mask layer is next stripped off to thereby form a plurality of real patterns respectively corresponding to the first patterns and a plurality of dummy patterns respectively corresponding to the second patterns, from the wiring pattern material layer.

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U.S. Appl. No. 10/273,091, filed Oct. 18, 2002, Yasuki Sakurai et al.

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