Pixel structures and fabricating methods thereof

Details Pixel structures and fabricating methods thereof Pixel structures and fabricating methods thereof

2011-04-19

2011-04-19

Pak, Sung H (Department: 2874)

Liquid crystal cells, elements and systems

Particular excitation of liquid crystal

Electrical excitation of liquid crystal

Reexamination Certificate

active

07929070

ABSTRACT:
A fabricating method of a pixel structure is provided, which uses the original processes of fabricating a thin film transistor to simultaneously fabricate a reflective layer with an uneven surface. In the fabrication process of the thin film transistor, a plurality of bumps are formed under the reflective layer which is to be formed later on. The bumps and a gate of the TFT are formed simultaneously or the bumps and a semiconductor layer of the TFT are formed simultaneously. In addition, by stacking layers on the bumps, the reflective layer formed on the bumps can have good uneven shapes on the surface thereon. Therefore, the fabricating method of a pixel structure has simple processes and low manufacturing costs, and can be used for fabricating a transflective pixel structure or a reflective pixel structure.

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patent: 2006/0170845 (2006-08-01), Lee
patent: 2008/0062364 (2008-03-01), Lee et al.
patent: 2008/0111935 (2008-05-01), Lee et al.

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