Pixel structure and manufacturing method thereof

Details Pixel structure and manufacturing method thereof Pixel structure and manufacturing method thereof

2007-06-23

2010-02-02

Stahl, Mike (Department: 2874)

Liquid crystal cells, elements and systems

Particular structure

Having significant detail of cell structure only

Reexamination Certificate

active

07656479

ABSTRACT:
A pixel structure disposed on a substrate includes a gate, a patterned dielectric layer, a patterned semiconductor layer, a patterned metal layer, an overcoat layer and a transparent pixel electrode. The patterned dielectric layer and the gate covered thereby are disposed on the substrate. The patterned semiconductor layer on the patterned dielectric layer includes bumps and a channel above the gate. The patterned metal layer includes a source, a drain and a reflective pixel electrode connecting the drain. The source and the drain cover a portion of the channel. The reflective pixel electrode covers the bumps. The gate, the patterned dielectric layer, the patterned semiconductor layer and the patterned metal layer form a transistor on which the overcoat layer has a contact hole exposing a portion of the reflective pixel electrode. The transparent pixel electrode on the overcoat layer electrically connects the reflective pixel electrode through the contact hole.

REFERENCES:
patent: 6208395 (2001-03-01), Kanoh et al.
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patent: 2006/0170845 (2006-08-01), Lee
patent: 2006/0208275 (2006-09-01), Yun
patent: 2007/0268440 (2007-11-01), Nagano
patent: 2008/0062364 (2008-03-01), Lee et al.
patent: 1936662 (2007-03-01), None

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