Pixel electrode, method for forming the same, electrooptical...

Details Pixel electrode, method for forming the same, electrooptical... Pixel electrode, method for forming the same, electrooptical...

2006-05-25

2010-12-07

Nelms, David (Department: 2871)

Liquid crystal cells, elements and systems

Particular structure

Having significant detail of cell structure only

C349S139000, C349S147000, C349S187000

Reexamination Certificate

active

07847903

ABSTRACT:
A method for forming a pixel electrode on a substrate, including: forming a bank corresponding to a region for forming the pixel electrode on a substrate; disposing, by a liquid ejection method, a first functional liquid containing transparent conductive microparticles in the region partitioned by the bank; drying the first functional liquid to produce a first layer film; disposing, by a liquid ejection method, a second functional liquid containing a silicon compound onto the first layer film; and forming a pixel electrode made of a laminate that includes: a transparent conductive layer which is formed by calcining together the first layer film and the second functional liquid and is composed of the first layer film and silicon oxide filling a pore in the first layer film; and a silicon oxide layer formed on the transparent conductive layer.

REFERENCES:
patent: 7136127 (2006-11-01), Furusawa
patent: 2003/0193624 (2003-10-01), Kobayashi et al.
patent: 2004/0004678 (2004-01-01), Furusawa
patent: 09-194233 (1997-07-01), None
patent: 2003-318131 (2003-11-01), None
patent: 2005-013985 (2005-01-01), None
patent: 2005-064034 (2005-03-01), None
patent: WO 2005/048354 (2005-05-01), None
Communication from European Patent Office re: related application, Sep. 18, 2006.

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