PIN photodiode formed from an amorphous semiconductor

Batteries: thermoelectric and photoelectric – Photoelectric – Cells

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357 4, 357 30, 357 88, H01L 3106

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047847026

ABSTRACT:
The invention provides a PIN photodiode in which at least one of the P, I, N layers is formed by a composition multi-layer including undoped superimposed layers of amorphous semiconductor and undoped insulator. In one embodiment, the P and N layers are formed by an amorphous multi-layer, with five periods for the P layer and nine periods for the N layer, and the I layer is formed from an amorphous semiconductor.

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