Active solid-state devices (e.g. – transistors – solid-state diode – With specified impurity concentration gradient – With high resistivity
Reexamination Certificate
2011-01-11
2011-01-11
Lee, Eugene (Department: 2815)
Active solid-state devices (e.g., transistors, solid-state diode
With specified impurity concentration gradient
With high resistivity
C257S623000, C257SE27046
Reexamination Certificate
active
07868428
ABSTRACT:
A PIN diode comprising an N-type substrate comprising a cathode of the PIN diode and having an intrinsic layer disposed upon the N-type substrate and having a top surface a P-type material disposed upon the top surface of the intrinsic layer comprising an anode of the PIN diode and a N-type material disposed over the sidewall of the cathode and over the sidewall and a portion of the top surface of the intrinsic material that is not occupied by the anode, wherein a horizontal gap is defined between the anode and the cathode through the intrinsic material, the gap being variable in width and/or the horizontal gap is less than the thickness of the intrinsic layer.
REFERENCES:
patent: 4999696 (1991-03-01), Gentner et al.
patent: 5268310 (1993-12-01), Goodrich et al.
patent: 5343070 (1994-08-01), Goodrich et al.
patent: 2006/0076589 (2006-04-01), Gao et al.
Brogle James Joseph
Goodrich Joel Lee
Lee Eugene
M/A-COM Technology Solutions Holdings Inc.
Maiorana PC Christopher P.
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