Phyllosilicate-intercalation compounds

Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing

Reexamination Certificate

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Reexamination Certificate

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07371360

ABSTRACT:
A method for producing phyllosilicate-intercalation compounds with an increased expansion volume and/or a modified onset temperature includes intercalating intercalated compounds in native, expandable phyllosilicates, wherein the native phyllosilicate is subjected to ion exchange with at least one cationic surfactant and, at the same time or in a further step, at least one organic intercalation compound is intercalated in the phyllosilicate, with the proviso that the intercalation of dimethylformamide, chloroform, dimethylacetamide, toluene and dimethylsulfoxide can take place also without a prior ion exchange.

REFERENCES:
patent: 3758415 (1973-09-01), Wada et al.
patent: 4156533 (1979-05-01), Close et al.
patent: 4305992 (1981-12-01), Langer et al.
patent: 4956121 (1990-09-01), Tymon et al.
patent: 5326500 (1994-07-01), Friedman et al.
patent: 69517289 (2000-12-01), None
patent: 69615090 (2002-06-01), None
patent: 0429246 (1991-05-01), None
patent: 0219472 (2002-03-01), None
K. Jasmund and G. Lagaly (Hrsg.) “Tonminerale und Tone” (Clay Minerals and Clays), Darmstadt, Dr. Dietrich Steinkopff Verlag GmbH & Co. KG, 1993, pp. 129-152.
Patent Abstract of Japan, JP-09227119, Sep. 2, 1997.

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