Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Silver compound sensitizer containing
Patent
1994-06-24
1995-08-08
Chea, Thorl
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Silver compound sensitizer containing
430203, 430607, 430613, G03C 1498
Patent
active
054397901
ABSTRACT:
Photothermographic elements having improved post-processing stabilty are described. These elements comprise a support bearing at least one photosensitive, image-forming photothermographic-emulsion layer comprising:
REFERENCES:
patent: 3180731 (1965-04-01), Roman et al.
patent: 3457075 (1969-07-01), Morgan et al.
patent: 3531286 (1970-09-01), Renfrew
patent: 3615617 (1971-10-01), Muller-Bardorff
patent: 3674478 (1972-07-01), Grasshoff et al.
patent: 3698898 (1972-10-01), Grasshoff et al.
patent: 3761270 (1973-09-01), Mauriac et al.
patent: 3791830 (1974-02-01), Abele
patent: 3839049 (1974-10-01), Simons
patent: 3844797 (1974-10-01), Willems et al.
patent: 3993661 (1976-11-01), Grasshoff et al.
patent: 4009029 (1977-02-01), Hammond et al.
patent: 4021240 (1977-05-01), Cerquone et al.
patent: 4022617 (1977-05-01), McGuckin
patent: 4128557 (1978-12-01), Knight et al.
patent: 4137079 (1979-01-01), Houle
patent: 4138265 (1979-02-01), Shino
patent: 4144072 (1979-03-01), Ikenoue et al.
patent: 4245033 (1981-01-01), Eida et al.
patent: 4260677 (1981-04-01), Winslow et al.
patent: 4310612 (1982-01-01), Mooberry et al.
patent: 4335200 (1982-06-01), Ohashi et al.
patent: 4350752 (1982-09-01), Reczek et al.
patent: 4351896 (1982-09-01), Altland et al.
patent: 4378424 (1983-03-01), Altland et al.
patent: 4404390 (1983-09-01), Altland et al.
patent: 4416977 (1983-11-01), Ohashi et al.
patent: 4420554 (1983-12-01), Ohashi et al.
patent: 4451561 (1984-05-01), Hirabayashi et al.
patent: 4460681 (1984-07-01), Frenchik
patent: 4510236 (1985-04-01), Gutman
patent: 4511644 (1985-04-01), Okamura et al.
patent: 4678735 (1987-07-01), Kitaguchi et al.
patent: 4734353 (1988-03-01), Ono et al.
patent: 4837141 (1989-06-01), Kohno et al.
patent: 4883747 (1989-11-01), Grieve et al.
patent: 4888268 (1989-12-01), Itoh et al.
patent: 5158866 (1992-10-01), Simpson et al.
patent: 5175081 (1992-12-01), Krepski et al.
patent: 5298390 (1994-03-01), Sakizadeh et al.
patent: 5300420 (1994-04-01), Kenny et al.
Amit, B and Patchornik A. Israel Journal of Chemistry, vol. 12, Nos. 1-2, 1974, pp. 103-113.
Barltrop, J. A., et al Chemical Communication, No. 22, 1966, pp. 822-823.
Okada, Keiji J. Chem. Soc., Chem. Commun., 1989, pp. 1636-1637.
Okada, Keiji and Oda, Masaji J. Am. Chem. Soc., vol. 110, No. 26, 1988, pp. 8736-8738.
Pillai, V. N. R. Synthesis, 1980, Georg Thieme Publishers; pp. 1-26.
Research Disclosure, May 1978, No. 16979 and 16977, pp. 66-69.
Research Disclosure, Jun., 1978, No. 17029, pp. 9-15.
Reserach Disclosure, Mar. 1989, No. 29963, pp. 208-214.
Kenney Raymond J.
Manganiello Frank J.
Muthyala Ramaiah
Sakizadeh Kumars
Simpson Sharon M.
Chea Thorl
Evearitt Gregory A.
Griswold Gary L.
Kirn Walter N.
Minnesota Mining and Manufacturing Company
LandOfFree
Phthalimide blocked post-processing stabilizers for photothermog does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Phthalimide blocked post-processing stabilizers for photothermog, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Phthalimide blocked post-processing stabilizers for photothermog will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-970503