Photovoltaic device including a boron doping profile in an i-typ

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material

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257 55, 257458, 257656, 136258, 136261, H01L 2714, H01L 3100

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active

052568873

ABSTRACT:
A photovoltaic cell for use in a single junction or multijunction photovoltaic device, which includes a p-type layer of a semiconductor compound including silicon, an i-type layer of an amorphous semiconductor compound including silicon, and an n-type layer of a semiconductor compound including silicon formed on the i-type layer. The i-type layer including an undoped first sublayer formed on the p-type layer, and a boron-doped second sublayer formed on the first sublayer.

REFERENCES:
patent: 4379943 (1983-04-01), Yang et al.
patent: 4398054 (1983-08-01), Madan
patent: 4581476 (1986-04-01), Yamazaki
patent: 4681984 (1987-07-01), Moeller
patent: 4728370 (1988-03-01), Ishii et al.
patent: 4742012 (1988-05-01), Matsumura et al.
patent: 4772933 (1988-09-01), Schade
patent: 4784702 (1988-11-01), Henri
patent: 5032884 (1991-07-01), Yamagishi et al.
patent: 5034333 (1991-07-01), Kim
patent: 5039353 (1991-08-01), Schmitt
Kondo et al., "Effects of low level doping of i-layer in a--SiC:H/a--Si:H heterojunction solar cells", IEEE-Oct. 1987, pp. 604-609.
Hack et al., "The Role of Boron Profiling in Enhancing the Performance of Amorphous Silicon Based Alloy P-I-N Solar Cells", 17th IEEE Photovoltaic Specialists Conference, Oct. 30, 1984, pp. 336-340.
Sichanugrist et al., "Amorphous Silicon Solar Cells with Graded Boron-Doped Active Layers", J. Appl. Phys., vol. 54, No. 1, Nov. 1983, pp. 6705-6707.
Sichanugrist et al., "Modeling and Experimental Performance of Amorphous Silicon Solar Cells with Graded Boron-Doped Active Layers", Solar Energy Materials, vol. 11, 1984, pp. 35-44.
Matsushita et al., "High Performance Hydrogenated Amorphous Si Solar Cells with Graded Boron-Doped Intrinsic Layers Prepared from Disilane at High Deposition Rates", Appl. Phys. Lett., vol. 44, No. 11, Jun. 1984, pp. 1092-1094.
Konagai et al., "Effect of Diborane Profile on the Photovoltaic Performance of A-Si:H Solar Cells Prepared by Glow Discharge of Disilane", 17th IEEE Photovoltaic Specialists Conference, Oct. 30, 1984, pp. 347-352.
Moeller et al., "Enhanced Stability of Amorphous Silicon pin Solar Cells by Doping Profiles", Mat. Res. Soc. Symp. Proc., vol. 49, 1985, pp. 325-330.
Moustakas et al., "Effect of Boron Compensation on the Photovoltaic Properties of Amorphous Silicon Solar Cells", Appl. Phys. Lett., vol. 43, No. 4, Aug. 1983, pp. 368-370.

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