Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material
Patent
1992-07-30
1995-10-03
Hille, Rolf
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Amorphous semiconductor material
257 51, 257431, 257461, 257462, 257 52, 136258, H01L 2904, H01L 2714, H01L 3100
Patent
active
054554306
ABSTRACT:
The disclosure relates to a semiconductor device comprising silicon having a substrate composed of low grade silicon, a silicon layer whose silicon purity is higher than that of the low grade silicon formed on the substrate and an electrode formed on the silicon layer. In the device, the low grade silicon may be selected from metallurgical grade silicon and silicon whose purity is less than 99.99%, and the silicon layer may be over 99.999% purity or semiconductor grade.
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Iwata Hiroshi
Noguchi Shigeru
Sano Keiichi
Arroyo T. M.
Hille Rolf
Sanyo Electric Co,. Ltd.
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