Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1980-10-08
1982-08-10
Louie, Jr., Won H.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430270, 430281, 430286, 430275, 430344, 430338, 430332, G03C 152, G03C 168
Patent
active
043438857
ABSTRACT:
Compositions containing a polymerizable, curable or crosslinkable component, a photoinitiator, a fluoran colorformer and a latent activator that releases or promotes the release of a Lewis acid, will become insoluble and change color under the influence of actinic radiation. These compositions are particularly useful to make dry film photoresists, which are widely used in the electronics industry to manufacture printed circuits.
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Hamb, Application Serial Number 077,379, filed Oct. 1, 1970, laid open to public inspection on Aug. 31, 1971.
Dynachem Corporation
Louie, Jr. Won H.
White Gerald K.
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