Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1985-07-18
1987-02-10
Kittle, John E.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204298, 422186, 4221863, C23C 1500
Patent
active
046421718
ABSTRACT:
A phototreating apparatus has a vacuum container for storing a solid material, a gas inlet for introducing a photoreactive gas into the container, and a light source for radiating into the container, light having a specific wavelength such that it causes a photoreaction of the photoreactive gas. The apparatus phototreats the solid material in the container by utilizing the photoreaction of the photoreactive gas. At least an inner surface of the vacuum container consists of a material which absorbs the light having the specific wavelength.
REFERENCES:
patent: 4419201 (1983-12-01), Levinstein et al.
patent: 4496420 (1985-01-01), Frolich et al.
patent: 4529475 (1985-07-01), Okano et al.
Horiike Yasuhiro
Okano Haruo
Sekine Makoto
Kabushiki Kaisha Toshiba
Kittle John E.
Ryan Patrick
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