Photothermographic materials incorporating antifoggants

Details Photothermographic materials incorporating antifoggants Photothermographic materials incorporating antifoggants

2007-02-26

2008-11-18

Chea, Thorl (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Thermographic process

Heat applied after imaging

C430S529000, C430S530000, C430S607000, C430S619000, C430S631000

Reexamination Certificate

active

07452661

ABSTRACT:
Incorporation of certain compounds into photothermographic materials provides materials with reduced initial image Dminand improved Raw Stock Keeping film stability without unacceptable loss in sensitometric properties. These compounds include certain e-i) zinc salts of an aryl sulfonic acid or of a fluorinated C2-C6carboxylic acid, e-ii) non-encapsulated alkali metal salts of an aryl sulfonic acid or of a fluorinated C2-C6carboxylic acid, and e-iii) fluorinated C2-C6carboxylic acids.

REFERENCES:
patent: 3192251 (1965-06-01), Gray
patent: 4772544 (1988-09-01), Hirai
patent: 6184335 (2001-02-01), McCloskey et al.
patent: 6485898 (2002-11-01), Yoshioka et al.
patent: 0 143 424 (1985-06-01), None
patent: 2006-30236 (2000-07-01), None
patent: 2000-199936 (2002-07-01), None
patent: 2002-196448 (2006-02-01), None
JP2000-199936, partial translation of paragraphs 0006,0008,0015,0016, 0023, 0024, 0025, 0029 and 0030.

Affiliated with

Also associated with

Rating

Photothermographic materials incorporating antifoggants does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photothermographic materials incorporating antifoggants, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photothermographic materials incorporating antifoggants will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4043271