Photothermographic material, composition and process

Gas separation: apparatus – Electric field separation apparatus – Including gas flow distribution means

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

96109, 961141, 961146, G03C 102, G03C 172, G03C 134

Patent

active

041054512

ABSTRACT:
An improved photothermographic material can be prepared by sequentially mixing the following components: (1) a dispersion comprising a 2-mercaptobenzothiazole, 2-mercaptobenzimidazole, 2-mercaptobenzoxazole or 2-mercaptobenzoselenazole compound and a silver salt of certain heterocyclic thiones with (2) a reducing agent solution, (3) a binder, and (4) a silver halide photosensitive composition containing a spectral sensitizing dye, such as a symmetrical or unsymmetrical thiosulfato substituted benzimidazolocarbocyanine dye. A photothermographic material containing the described components can provide a developed image after imagewise exposure by merely heating the material to moderately elevated temperatures.

REFERENCES:
patent: 2410690 (1946-11-01), Smith et al.
patent: 2537880 (1951-01-01), Dent, Jr. et al.
patent: 2546642 (1951-03-01), Koerber
patent: 3369902 (1968-02-01), Abbott
patent: 3457078 (1969-07-01), Riester
patent: 3549379 (1970-12-01), Hellings et al.
patent: 3660102 (1972-05-01), Riester
patent: 3669672 (1972-06-01), Shiba et al.
patent: 3687678 (1972-08-01), Riester
patent: 3785830 (1974-01-01), Sullivan et al.
patent: 3832186 (1974-08-01), Masuda et al.
patent: 3893860 (1975-07-01), Sutton et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Photothermographic material, composition and process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photothermographic material, composition and process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photothermographic material, composition and process will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-917096

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.