Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product
Patent
1978-11-02
1981-08-11
Louie, Jr., Won H.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
430151, 430169, 430155, 430158, 430160, 430162, 430351, 430353, 430495, 430523, 430545, 430618, 430620, 430611, 430531, G03C 152, G03C 148, G03C 140
Patent
active
042834775
ABSTRACT:
In a photothermographic element comprising (A) at least one photosensitive layer comprising a photosensitive component, such as photosensitive silver halide or a diazotype photosensitive material, (B) at least one layer comprising a processing agent for the photosensitive component and (C) a separation polymer between (A) and (B), increased preexposure storage stability is provided by a polysulfonamide as separation polymer (C). After imagewise exposure of the photothermographic element, an image can be developed by merely heating the element to moderately elevated temperatures.
REFERENCES:
patent: 3248219 (1966-04-01), Jacobs
patent: 3438776 (1969-04-01), Yudelson
patent: 3484238 (1969-12-01), Fox
patent: 3520691 (1970-07-01), Scheler et al.
patent: 3531286 (1970-09-01), Renfrew
patent: 3576632 (1971-04-01), Bornemisza
patent: 3706557 (1972-12-01), Arond
patent: 3761270 (1973-09-01), Mauriac et al.
patent: 3785830 (1974-01-01), Sullivan et al.
patent: 3801321 (1974-04-01), Evans et al.
patent: 3871887 (1975-03-01), Jones
patent: 3893860 (1975-07-01), Sutton et al.
patent: 4032344 (1977-06-01), Fletcher et al.
patent: 4032518 (1977-06-01), Kotlarchik et al.
patent: 4039334 (1977-08-01), Ikengue
Research Disclosure, Jun. 1977, Item No. 15872 of Fletcher et al.
Research Disclosure, Mar. 1975, Item No. 13107 of Fletcher et al.
Research Disclosure, Sep. 1977, Item No. 16105 of Fletcher et al.
Product Licensing Index, vol. 92, Dec. 1971, Item 9232.
Research Disclosure, Sep. 1977, Item 16160.
Derwent Abstract 32856U-A for SU-355192-S of Lvov Polytechnic.
Research Disclosure, vol. 158, Jun. 1977, Item 15869.
Research Disclosure, vol. 150, Oct. 1976, Item 15026.
Research Disclosure, vol. 157, May 1977, Items 15732, 15733, 15734, 15776.
Derwent Abstract 422764U-AF for SU-361182-S of Lvov POlytechnic.
Derwent Abstract 36825V/20 for German Pat. No. 2,352,348 of Fuji Photo Film Co. Ltd.
Derwent Abstract 23377V/13 for German Pat. No. 2,346,227 of Rhone-Poulenc SA.
DEMauriac Richard A.
Fletcher, Jr. George L.
Merrill Stewart H.
Eastman Kodak Company
Knapp Richard E.
Louie, Jr. Won H.
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