Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing
Reexamination Certificate
2008-01-01
2008-01-01
Chea, Thorl (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified backing or protective layer containing
C430S517000, C430S518000, C430S531000, C430S619000, C430S935000
Reexamination Certificate
active
07314706
ABSTRACT:
A photothermographic material containing an image forming layer having at least a photosensitive silver halide, a non-photosensitive organic silver salt, and a reducing agent for the organic silver salt on one side of a support, and a first non-photosensitive layer containing a dye fixing agent for a water-soluble dye, a second non-photosensitive layer disposed between the support and the first non-photosensitive layer, and a third non-photosensitive layer forming an outermost layer on the other side of the support, wherein at least one layer among the first, second and third non-photosensitive layers contains the water-soluble dye. The invention provides a photothermographic material which exhibits high image quality and excellent image storability, and a manufacturing method thereof.
REFERENCES:
patent: 5135835 (1992-08-01), Aono et al.
patent: 6027870 (2000-02-01), Tsuzuki et al.
patent: 6727057 (2004-04-01), Suzuki et al.
patent: 2006/0057512 (2006-03-01), Yamamoto et al.
patent: 1 035 430 (2000-09-01), None
patent: 1 079 269 (2001-02-01), None
patent: 1348997 (2003-01-01), None
patent: 1 348 997 (2003-10-01), None
patent: 2058609 (1981-04-01), None
patent: A 8-184936 (1996-07-01), None
patent: A 9-146220 (1997-06-01), None
patent: A 11-228698 (1999-08-01), None
Burke Margaret A.
Chea Thorl
FUJIFILM Corporation
Moss Sheldon J.
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