Radiation imagery chemistry: process – composition – or product th – Thermographic process – Heat applied after imaging
Reexamination Certificate
2006-01-27
2008-09-30
Chea, Thorl (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Thermographic process
Heat applied after imaging
C430S139000, C430S264000, C430S531000, C430S607000, C430S619000
Reexamination Certificate
active
07429447
ABSTRACT:
A photothermographic material having, on at least one side of a support, an image forming layer including at least a photosensitive silver halide, a non-photosensitive silver salt of a fatty acid, a reducing agent, and a binder, wherein 1) the photosensitive silver halide has an average silver iodide content of 40 mol % or higher, and 2) the photothermographic material includes a compound represented by the following formula (I) or a salt thereof:in-line-formulae description="In-line Formulae" end="lead"?R1—C≡C—R1′ Formula (I)in-line-formulae description="In-line Formulae" end="tail"?wherein R1and R1′ each independently represent a hydrogen atom, or a substituted or unsubstituted alkyl group, aryl group, or heterocyclic group, and R1and R1′ are not simultaneously a hydrogen atom. The invention provides a photothermographic material which exhibits high sensitivity and excellent image storability, and an image forming method.
REFERENCES:
patent: 4629684 (1986-12-01), Sato et al.
patent: 5089378 (1992-02-01), Ozaki et al.
patent: 6146823 (2000-11-01), Katoh
patent: A 11-295847 (1999-10-01), None
Burke Margaret A.
Chea Thorl
FUJIFILM Corporation
Moss Sheldon J.
LandOfFree
Photothermographic material and image forming method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photothermographic material and image forming method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photothermographic material and image forming method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3968724