Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Polymers from only ethylenic monomers or processes of...
Patent
1993-10-29
1996-04-09
Schofer, Joseph L.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Polymers from only ethylenic monomers or processes of...
5263285, C08F22400, C08F22010
Patent
active
055063217
ABSTRACT:
A photosensitive resin composition or photosensitive heat-curing resin composition comprising a photocurable oligomer containing 2 or more polymerizable double bonds and a carboxyl group and a heat-curing component selected from a compound containing one polymerizable double bond and one epoxy group, a compound containing one or more polymerizable double bonds and one or more blocked isocyanate groups; a photosensitive resin composition comprising a photocurable oligomer containing a carboxyl group, a blocked isocyanate group and 2 or more polymerizable double bonds; and a novel compound containing one or more polymerizable double bonds and one or more blocked isocyanate groups are disclosed. The resin compositions have high photosensitivity, excellent developability and provide a solder resist pattern with excellent properties.
REFERENCES:
patent: 4309561 (1982-01-01), Huemmer et al.
patent: 4816597 (1989-03-01), Snyder, II et al.
patent: 4943516 (1990-07-01), Kamayachi et al.
Database WPI, Derwent Publications Ltd., AN 89-238906, JP-A-1 174 522, Jul. 11, 1989.
Furuta Kiyonori
Koto Hiroyasu
Nakamura Shigeo
Nakao Eiko
Ajinomoto Co. Inc.
Cheng Wu C.
Schofer Joseph L.
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