Photosensitive transfer material having a support of defined rou

Details Photosensitive transfer material having a support of defined rou Photosensitive transfer material having a support of defined rou

1983-09-29

1985-12-17

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Stripping process or element

430258, 430259, 430260, 430271, 430273, 430523, G03C 300

Patent

active

045592926

ABSTRACT:
The present invention relates to a photosensitive transfer material, which comprises a flexible temporary support film which is preferably transparent, a thermoplastic photosensitive layer, optionally a flexible cover film on the free side of the photosensitive layer and, optionally, an intermediate layer between the support film and the photosensitive layer. The photosensitive transfer material is suitable for manufacturing photoresist stencils and solder masks. The temporary support film has a rough surface which exerts an embossing effect on the surface of the photosensitive layer and the intermediate layer, respectively. The mat-finish of the intermediate layer prevents an irregular deformation of this layer in moist air, while the mat-finish of the photosensitive layer precludes unwanted reflections.

REFERENCES:
patent: 1591304 (1926-07-01), Giveans
patent: 3010390 (1961-11-01), Buskes
patent: 3214274 (1965-10-01), Ohyama et al.
patent: 3884693 (1975-05-01), Bauer et al.
patent: 3891443 (1975-06-01), Halpern et al.
patent: 3909328 (1975-09-01), Dessauer et al.
patent: 4232108 (1980-11-01), Dessauer
patent: 4278752 (1981-07-01), Gervay et al.

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