Radiation imagery chemistry: process – composition – or product th – Stripping process or element – Element
Reexamination Certificate
2003-01-13
2004-01-20
Schilling, Richard L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Stripping process or element
Element
C430S258000, C430S259000, C430S262000, C430S263000, C430S527000
Reexamination Certificate
active
06680156
ABSTRACT:
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a photosensitive transfer material, and particularly to a photosensitive transfer material for preparation of color filters used in color liquid crystal displays.
2. Description of the Related Art
Photosensitive transfer materials for preparation of color filters used in color liquid crystal displays are known. For example, Japanese Patent Application Laid-Open (JP-A) Nos. 5-173820 and 11-149008 disclose examples of photosensitive transfer materials comprising a temporary support having successively disposed thereon a thermoplastic resin layer, an alkali-soluble interlayer and an alkali-soluble photosensitive resin layer containing a pigment. In these inventions, the photosensitive resin layer is usually adhered to a substrate for the photosensitive transfer material by a lamination method, and the temporary support is subsequently peeled off, after which the resultant product is subjected to exposure and development to form an image on the substrate.
This method has a problem in that after the lamination step has been completed and when the temporary support has been peeled off, the temporary support and a surface of a layer from which the temporary support has been peeled (a layer provided by applying a coating directly on the temporary support during manufacturing of the photosensitive transfer material) build up electrostatic charges due to peeling.
The charge voltage varies depending on the environmental temperature, relative humidity and a peeling rate, and hence cannot be simply defined. Occasionally the electrostatic voltage may exceed ±10 kV and thereby cause the following problems. A first problem is that dust is attracted by static electricity, possibly leading to pixel defects. A second problem is that when color filters are formed on thin-film transistors (TFT) aligned on a transparent substrate (Color Filter on Array—CoA mode), the thin-film transistors are broken by electrostatic charge caused by peeling. In recent years, as a rate of manufacturing color filters increases, a peeling rate of the temporary support increases, and therefore, such problems have become more and more significant.
In order to solve these problems, a method has been proposed to provide a static eliminator in a manufacturing line. Even if this method is employed, the voltage of electrostatic charges built up by peeling cannot sufficiently be reduced, and hence, techniques to cope with the problems are demanded.
SUMMARY OF THE INVENTION
An object of the present invention is to provide a photosensitive transfer material that achieves a reduced surface potential on a temporary support as well as on a surface of a layer from which the temporary support has been peeled off when peeling is carried out.
A first aspect of the present invention is a photosensitive transfer material comprising a temporary support having disposed thereon an alkali-soluble photosensitive resin layer containing a colorant, wherein when the temporary support is peeled from a layer provided between the temporary support and the photosensitive resin layer (hereinafter this layer is referred to as an “adjacent layer”) at a peeling rate of 1 m/min in an atmosphere of 25° C. and 30% RH, each of the temporary support and the adjacent layer has a surface potential whose absolute value is 5 kV or less after being peeled.
A second aspect of the invention is a photosensitive transfer material comprising a temporary support having disposed thereon an alkali-soluble photosensitive resin layer containing a colorant, wherein when the temporary support is peeled from an adjacent layer provided between the temporary support and the photosensitive resin layer at a peeling rate of 1 m/min in an atmosphere of 25° C. and 30% RH, each of the temporary support and the adjacent layer has a surface resistivity at 25° C. and 30% RH, of 1×10
14
&OHgr;/□ or less after being peeled.
A third aspect of the invention is a photosensitive transfer material comprising a temporary support having successively disposed thereon a thermoplastic resin layer, an alkali-soluble interlayer and an alkali-soluble photosensitive resin layer containing a colorant, wherein when the temporary support is peeled from the thermoplastic resin layer at a peeling rate of 1 m/min in an atmosphere of 25° C. and 30% RH, each of the temporary support and an adjacent layer has a surface potential whose absolute value is 5 kV or less after being peeled.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
Photosensitive Transfer Material
A photosensitive transfer material according to the present invention comprises a temporary support having disposed thereon an alkali-soluble photosensitive resin layer containing a colorant and is characterized in that when the temporary support is peeled from an adjacent layer provided between the temporary support and the photosensitive resin layer at a peeling rate of 1 m/min in an atmosphere of 25° C. and 30% RH, each of the temporary support and the adjacent layer has a surface potential whose absolute value is 5 kV or less after being peeled. Incidentally, a face of the temporary support on which the photosensitive resin layer is provided is referred to as a “front surface”, and a face opposite thereto is referred to as a “back surface”.
It is preferable that each of the temporary support and the adjacent layer has a surface electrical potential whose absolute value is 1 kV or less after being peeled.
It is also preferable that a difference between an amount of electrostatic charge on the front surface of the peeled temporary support when it is brought into contact with polyethylene terephthalate, and an amount of electrostatic charge on the surface of the peeled adjacent layer when it is brought into contact with polyethylene terephthalate is 0.5 nC/cm
2
or less.
The photosensitive transfer material according to the invention and a method of manufacturing color filters using the photosensitive transfer material will be described below.
Temporary Support
Conventionally known supports such as polyesters and polystyrenes may be used as the temporary support in the invention. Among these, biaxially oriented polyethylene terephthalate is preferable from the standpoints of cost, heat resistance and dimensional stability. A thickness of the temporary support is preferably about 15 to 200 &mgr;m, and more preferably about 30 to 150 &mgr;m. If the thickness of the temporary support falls within a range of about 15 to 200 &mgr;m, galvanized sheet-like wrinkles caused by heat do not occur during the laminating step, and further there is no disadvantage in terms of cost.
If necessary, the temporary support may be provided with additional coating layers, such as an electrically conductive layer, a charge controlling layer, a releasing layer and a subbing layer, and vapor-deposited layers. Herein, “temporary support” may collectively refer to the “temporary support” and these provided layers.
The releasing layer as used herein refers to a layer which is provided by applying a coating at an outermost portion of the temporary support, in order to lower a peel force between the temporary support and the adjacent layer, which is arranged on the front surface of the temporary support.
The subbing layer as used herein refers to a layer which is provided by applying a coating on the temporary support, for achieving various objects such as slipperiness and scratch resistance.
The electrically conductive layer and the charge controlling layer will be described below. These layers are provided mainly by applying a coating, but occasionally other methods, such as vapor deposition, may be employed.
Adjacent Layer
The adjacent layer as used herein refers to a layer which is provided adjacent to the temporary support. In the photosensitive transfer material according to the invention, after the laminating step, peeling is carried out between the temporary support and the adjacent layer. The adjacent layer is not particularly limited, and it may be a thermoplastic resin
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