Radiation imagery chemistry: process – composition – or product th – Stripping process or element – Element
Patent
1994-03-25
1995-04-25
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Stripping process or element
Element
430252, 430256, 430257, 430259, 430262, G03C 1805
Patent
active
054098009
ABSTRACT:
A photosensitive transfer material comprises a temporary substrate having provided thereon an alkali-soluble thermoplastic resin layer, an intermediate layer, and a photosensitive resin layer in this order, the interlaminar adhesion in the transfer material being the smallest at the interface between the thermoplastic resin layer and the temporary substrate. The photosensitive resin layer can be transferred to a permanent substrate without involving failure due to fine dust, air bubbles or unevenness of the permanent substrate. An image can be formed with the transfer material by adhering the transfer material to a permanent substrate at least under heat and, after stripping the temporary substrate, imagewise exposing the photosensitive resin layer to light, and processing the transferred layers to develop the photosensitive resin layer. If the thermoplastic resin layer and the intermediate layer are first removed with a processing method with which the photosensitive resin layer is not substantially developed and then the photosensitive resin layer is developed using a processing solution other than used for revmoving the thermoplastic resin layer and the intermediate layer, excessive fatigue of the developing solution for the photosensitive resin layer and unevenness of development can be prevented.
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Inoue Koji
Iwasaki Masayuki
Sato Morimasa
Shinozaki Fumiaki
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
Letscher Geraldine
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