Photosensitive resins containing a thienylacrylic acid ester or

Details Photosensitive resins containing a thienylacrylic acid ester or Photosensitive resins containing a thienylacrylic acid ester or

1974-01-02

1976-03-23

Kimlin, Edward C.

Gas separation: apparatus

Electric field separation apparatus

Electrode retaining or supporting means

96 351, 96 87R, 96115R, 20415914, G03C 168, G03C 500

Patent

active

039458318

ABSTRACT:
Photosensitive resins comprising high molecular weight compounds containing a thienylacrylic acid ester or amide group. These resins can be used for formation of images, optionally, in combination with at least one sensitizer. These resins have extremely high photosensitivity in comparison with conventional photosensitive high molecular weight compounds. The methods of preparing the polymer and the thienylacrylic acid ester or amide functional group containing monomers are disclosed.

REFERENCES:
patent: 3497354 (1970-02-01), Steppan et al.
patent: 3499759 (1970-03-01), Maar et al.
patent: 3738973 (1973-06-01), Augarten et al.
patent: 3770443 (1973-11-01), Osada et al.
patent: 3804628 (1974-04-01), Osada et al.

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